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To light emitting diodes (LEDs), solving the common non-uniform current injection and efficiency degradation issues in (0001) plane micro-LED is essential. Herein, we investigated the light emission characteristics of various mesa sizes and different p-electrode areas toward the realization of coaxial GaInN/GaN multi-quantum-shell (MQS) nanowires (NWs)-based micro-LEDs. As the mesa area was reduced, the current leakage decreases, and further reduction of the area showed a possibility of realizing micro-LED with less current leakage. The large leakage path is mainly associated with the defective MQS structure on the (0001) plane area of each NW. Therefore, more NWs involved in an LED chip will induce higher reverse leakage. The current density-light output density characteristics showed considerably increased electroluminescence (EL) intensity as the mesa area decreased, owing to the promoted current injection into the efficient NW sidewalls under high current density. The samples with a mesa area of 50 × 50 µm2 showed 1.68 times higher light output density than an area of 100 × 100 µm2 under a current density of 1000 A/cm2. In particular, the emission from (1-101) and (10-10) planes did not exhibit an apparent peak shift caused by the quantum-confined Stark effect. Furthermore, by enlarging the p-electrode area, current can be uniformly injected into the entire chip with a trade-off of effective injection to the sidewall of each NW. High performance of the MQS NW-based micro-LED can be expected because of the mitigated efficiency degradation with a reducing mesa area and an optimal dimension of p-electrode.

We investigate the sub-bandgap optical absorption (SOA) in 300-nm-thick Al1−xInxN alloys used in cladding layers of edge-emitting laser diodes and distributed Bragg reflectors of vertical-cavity surface-emitting lasers. Al1−xInxN alloys, with indium content x ranging from 0.114 to 0.185, were grown by metal-organic chemical vapor deposition on a c-plane GaN/sapphire template. SOAs on 300-nm-thick thin films were characterized using photothermal deflection spectroscopy (PDS). Thermal emission, such as nonradiative recombination with phonon emission, is the dominant energy relaxation process occurring after SOA in Al1−xInxN alloys. The absorption coefficient of the SOA was estimated to be 0.6–7.0 × 103 cm−1 in these samples by combining PDS and spectroscopic ellipsometry. The drastic increase in the SOA, when x exceeded the lattice-matched composition of the GaN/sapphire template, indicates that impurities, vacancy-type defects, and their complexes with increasing x are possible candidates that result in SOA in Al1−xInxN alloys. [ABSTRACT FROM AUTHOR]

GaInN/GaN multi-quantum-shell (MQS) nanowires (NWs) are gaining increasing attention as promising materials for developing highly efficient long-wavelength micro-light emitting diodes (LEDs). To improve the emission properties in GaInN/GaN MQS NWs, it is necessary to suppress the emission from the (0001) c-plane MQS at the apex region, which featured with low crystalline quality. In this study, we investigated the enhancement of optical properties and the realization of micro-LEDs by confirming the effect of the (0001) plane region. A 7.9-fold enhancement of the electroluminescence (EL) intensity was demonstrated by removal the (0001) plane region via inductively coupled plasma (ICP) dry etching, owing to the promoted current injection into the (1–101) semi-polar and (10–10) non-polar sidewall area. To investigate the effect of the emission area on the samples with and without truncated (0001) plane region, devices with three different mesa areas (50 × 50, 100 × 100, and 100 × 200 μm2) were fabricated. An increased EL intensity with the reduced mesa areas was observed in the samples without dry etching of the (0001)-plane area, because more current can be injected into the sidewall region with higher crystalline quality and luminous efficiency than the (0001)-plane MQS. Under the same injection current density, the truncated samples’ light output was increased for more than ten times as compared to the samples without (0001)-plane etching. Therefore, it confirms the possibility of realizing highly efficient GaInN/GaN MQS NWs LEDs by eliminating the (0001) plane MQS region. A precise etching and surface passivation of the apex region is expected to further reduce the reverse leakage current and improve the performance in NW-LEDs.

Improving current injection into r- and m-planes of nanowires (NWs) is essential to realizing efficient GaInN/GaN multiple quantum shell (MQS) NW-based light-emitting diodes (LEDs). Here, we present the effects of different p-GaN shell growth conditions on the emission characteristics of MQS NW-LEDs. Firstly, a comparison between cathodoluminescence (CL) and electroluminescence (EL) spectra indicates that the emission in NW-LEDs originates from the top region of the NWs. By growing thick p-GaN shells, the variable emission peak at around 600 nm and degradation of the light output of the NW-LEDs are elaborated, which is attributable to the localization of current in the c-plane region with various In-rich clusters and deep-level defects. Utilizing a high growth rate of p-GaN shell, an increased r-plane and a reduced c-plane region promote the deposition of indium tin oxide layer over the entire NW. Therefore, the current is effectively injected into both the r- and m-planes of the NW structures. Consequently, the light output and EL peak intensity of the NW-LEDs are enhanced by factors of 4.3 and 13.8, respectively, under an injection current of 100 mA. Furthermore, scanning transmission electron microscope images demonstrate the suppression of dislocations, triangular defects, and stacking faults at the apex of the p-GaN shell with a high growth rate. Therefore, localization of current injection in nonradiative recombination centers near the c-plane was also inhibited. Our results emphasize the possibility of realizing high efficacy in NW-LEDs via optimal p-GaN shell growth conditions, which is quite promising for application in the long-wavelength region.

Iron-based superconductor Sr2VFeAsO3 is composed of alternate stacking of a superconducting FeAs layer and an insulating vanadium-oxide layer with a perovskite-type structure. Electronic orders stemming from the spin and orbital degrees of freedom of V 3d electrons can arise in the vanadium-oxide layer, but such orders have not been confirmed so far. Here, we systematically investigate the electronic state of Sr2VFeAsO3−δ with oxygen deficiency and demonstrate the phase diagram of Sr2VFeAsO3−δ as a function of the c-axis lattice parameter, which has turned out to be a suitable measure of the amount of oxygen deficiency. We found a magnetic and structural anomaly at ∼100 K with a thermal hysteresis, which is manifested with the introduction of oxygen deficiency. The presence of orthorhombic distortion was revealed below the temperature at which the anomaly appears, suggestive of V orbital ordering involving the dx z and dy z orbitals. It seems that substantial fluctuations associated with the orthorhombic distortion significantly influence the electronic state of the FeAs layer. Our findings indicate that the vanadium-oxide layer plays a significant role in the electronic state of Sr2VFeAsO3−δ. [ABSTRACT FROM AUTHOR]