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We report the development of a scanning confocal microscope dedicated to photoluminescence in the 200 nm-wavelength range for samples at cryogenic temperatures (5 K–300 K). We demonstrate the performances of our deep ultraviolet cryomicroscope in high-quality hexagonal boron nitride (hBN) crystals, although it can be utilized for biological studies in its range of operating wavelengths. From the mapping of photoluminescence, we bring evidence for the suppression of extrinsic recombination channels in regions free from defects. The observation of emission spectra dominated by intrinsic recombination processes was never reported before in hBN by means of photoluminescence spectroscopy. We show that photoluminescence tomography now competes with cathodoluminescence and that deep ultraviolet cryomicroscopy by photoluminescence is a novel powerful tool in materials science applications, with the great advantage of an efficient non-invasive photo-excitation of carriers. [ABSTRACT FROM AUTHOR]

The luminescence efficiency of AlxGa1−xN quantum dots (QDs) and quantum wells (QWs), buried in AlN cladding layers and emitting in the ultraviolet range between 234 and 310 nm, has been investigated. The growth and optical properties have been done using similar aluminum composition (varying from 0.4 to 0.75) for both QDs and QWs. In order to compare as much as possible the optical properties, the QWs were fabricated with a growth time tuned such that the QW width is similar to the average height of the QDs. The photoluminescence (PL) showed emission ranging from 4 to 5.4 eV, putting into evidence differences in terms of full width at half maximum, PL intensity, and asymmetry of the line shape between QDs and QWs. The results show shorter wavelengths and a slightly narrower PL linewidth for QWs. To determine the light emission dependence with the electric field direction in the crystal, the evolutions of the emission diagrams for all samples were recorded along two orthogonal directions, namely, the "in-plane" (growth) and the "on-side" directions, from which the light emission was collected. For the whole QDs and QWs samples' series, the shapes of the emission diagram indicate emission in both in-plane and on-side directions, as evidenced by intra-valence band mixings caused by strain effects combined with the anisotropic Coulomb interactions that are particularly contributing to the polarization at wavelengths below 260 nm. Furthermore, the degree of polarization, determined for each sample, showed good agreement with results from the literature. [ABSTRACT FROM AUTHOR]

The polarized photoluminescence emitted on the edge of a series of aluminum‐rich (Al,Ga)N‐AlN quantum wells (QWs) grown by molecular beam epitaxy on AlN templates deposited by metal organic chemical vapor deposition on c‐plane sapphire is measured. The contrast and the principal axis of the emission diagrams for 2 nm‐thick (Al,Ga)N QWs grown for aluminum compositions between 40% and 90% are studied. The light is emitted on the edge of the QWs at wavelengths going from 280 nm down to 209 nm. The emission diagram, a change from oblate to prolate with respect to the in‐plane orientation, for an aluminum composition is found to occur around 72%, that is, at an emission wavelength of about 235 nm. The orientations and shapes of the edge‐emission diagrams indicate that the fluctuations of the composition of the (Al,Ga)N confining layer are deep enough for producing intravalence band mixings. This property, that acts in concert with the built‐in strain and quantum‐confined Stark effect, contributes to the anisotropy of the light emission when the aluminum composition reaches 60–70%, that is, for an emission wavelength of 260–235 nm. [ABSTRACT FROM AUTHOR]

Boron nitride (BN) layers with sp2 bonding have been grown by metal organic chemical vapor deposition on AlN underlayers, which are deposited on c-plane sapphire substrates. Two different boron precursors were employed—trimethylboron and triethylboron—while ammonia was used as the nitrogen precursor. The BN obtained epitaxial BN films contain ordered rhombohedral (rBN) and partially ordered turbostratic (tBN) stackings as evidenced by x-ray diffraction analysis. We discriminatively identify the PL signatures of the rBN and tBN from those typical of the hexagonal (hBN) and Bernal stackings (bBN). The optical signature of tBN appears at 5.45 eV, and it intercalates between the two recombination bands typical of rBN at 5.35 eV (strong intensity) and 5.55 eV(weaker intensity). The analogs of the high intensity band at 5.35 eV in rBN sit at 5.47 eV for hBN and at 5.54 eV for bBN. [ABSTRACT FROM AUTHOR]

In this work, we investigate the impact of the quantum confined Stark effect and of the carrier localization on the internal quantum efficiency of polarized single or multiple In x Ga 1-x N/GaN quantum well(s), and semi-polar (11–22) multiple In x Ga 1-x N/In y Ga 1-y N quantum well. We find that increasing the influence of the quantum confined Stark effect at constant indium content with increasing the well-width induces a reduction of the internal quantum efficiency onsets for a decreasing value of the photoexcitation density. Similar but no so dramatic trend is reported when increasing the indium content and thus when increasing the localization of carriers to localized fluctuations of the chemical composition of the alloy. In addition, a change of the electric field internal to active layers (quantified by using time-resolved photoluminescence spectroscopy) realized by growing samples along a semi-polar orientation leads to experimental observation of a substantial enhancement of the threshold of photoexcitation density at which onsets the reduction of the internal quantum efficiency. A correlation is found through several orders of magnitude between the photoexcitation density P T for the onset of the collapse of IQE and the values of the photoluminescence radiative decay time τ rad . A scaling law is found in the investigated samples: P T ∼ τ rad - n with n = 3/2 ± 0.15 which evidences that quantum confined Stark effect is the main origin for the efficiency droop in nitride light-emitting diodes based on In x Ga 1-x N active layers. [ABSTRACT FROM AUTHOR]

We determine the internal quantum efficiency of strain-balanced AlGaN-InGaN-GaN hetero-structures designed for yellow-amber light emission, by using a recent model based on the kinetics of the photoluminescence decay initiated by Iwata et al. [J. Appl. Phys. 117, 075701 (2015)]. Our results indicate that low temperature internal quantum efficiencies sit in the 50% range and we measure that adding an AlGaN layer increases the internal quantum efficiency from 50% up to 57% with respect to the GaN-InGaN case. More dramatic, it almost doubles from 2.5% up to 4.3% at room temperature. [ABSTRACT FROM AUTHOR]

The variation of the internal quantum efficiency (IQE) of single InGaN quantum well structures emitting from blue to red is studied as a function of the excitation power density and the temperature. By changing the well width, the indium content, and adding a strain compensation AlGaN layer, we could tune the intrinsic radiative recombination rate by changing the quantum confined Stark effect, and we could modify the carrier localization. Strong quantum confined Stark effect and carrier localization induce an increase in the carrier density and then favor Auger non-radiative recombination in the high excitation range. In such high excitation conditions with efficient Auger recombination, the variation of the IQE with the photo-excitation density P is ruled by a universal power law independent of the design: IQE=IQEMAX – a log10P with a close to 1/3. The temperature dependences of the different recombination mechanisms are determined. At low temperature, both quantum confined Stark effect and carrier localization trigger electron-electron repulsions and therefore the onset of the Auger effect. The increase in the value of coefficient C with changing temperature reveals indirect Auger recombination that relates to the interactions of the carriers with other phonons than the longitudinal optical one. [ABSTRACT FROM AUTHOR]

Light-emitting devices based on high-Al content (Al,Ga)N suffer from high densities of dislocations or other point defects, counterbalanced by the carrier localization arising from disorder in the ternary alloy. One way to improve the internal quantum efficiency is the controlled Si-doping of Al xGa1− xN/Al yGa1− yN multi-quantum wells, which was assigned to the reduction of point defects by reduction of internal strains, for some ideal concentration of Si. Time-resolved photoluminescence (TR-PL) can be used [S. F. Chichibu et al., Appl. Phys. Lett. 99, 051902 (2011)] to try and correlate the observed PL time-decays with the density of defects, in relation with the nonradiative recombination probability of photoexcited carriers. We present TR-PL studies of MOVPE-grown Si-doped Al xGa1− xN/Al yGa1− yN multi-quantum wells with typical values of x = 0.6 and y = 0.7 and of Al xGa1− xN epilayers with x up to 0.86. High-Al content MQWs and epilayers exhibit similar bi-exponential PL decay dynamics, with the slower component rapidly quenched when T is increased. The fast decay component remains in the nanosecond range at all temperatures and the PL intensity loss is limited by carrier localization. [ABSTRACT FROM AUTHOR]

We review the recent advance in the understanding of the optoelectronic properties of hexagonal boron nitride (hBN) in the deep ultraviolet. The comparison between bulk hBN and monolayer hBN highlights some of theirmajor differences such the bandgap nature, the excitonic binding energy and the phononassisted broadening of the excitonic lines. Perspectives point out the relevance of addressing the regime of hBN samples made of a very few number of monolayers, including twisted hBN monolayers in the context of twistronics. [ABSTRACT FROM AUTHOR]

The effect of thermal annealing on In0.25Ga0.75N/GaN quantum wells grown by molecular beam epitaxy at 550 °C is investigated. A strong increase in the 300 K photoluminescence (PL) intensity is observed for samples annealed at 880 °C, while degradation occurs for higher temperatures. The improvement of the optical properties is ascribed to higher internal quantum efficiency (IQE), as indicated by temperature-dependent and time-resolved PL experiments. The effect of carrier localization due to possible quantum dot formation via indium clustering is ruled out based on high-resolution transmission electron microscopy imaging. IQE improvement is thus attributed to a reduction of point defects upon annealing. [ABSTRACT FROM AUTHOR]

We investigate the optical properties of porous GaN films of different porosities, focusing on the behaviors of the excitonic features in time-integrated and time-resolved photoluminescence. A substantial enhancement of both excitonic emission intensity and recombination rate, along with insignificant intensity weakening under temperature rise, is observed in the porous GaN films. These observations are in line with (i) the local concentration of electric field at GaN nanoparticles and pores due to the depolarization effect, (ii) the efficient light extraction from the nanoparticles. Besides, the porosification enlarges the surface of the air/semiconductor interface, which further promotes the extraction efficiency and suppresses non-radiative recombination channels. Our findings open a way to increasing the emission efficiency of nanophotonic devices based on porous GaN. [ABSTRACT FROM AUTHOR]