144 results on '"Xiong, Shisheng"'
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2. Manipulating the processing window of directed self-assembly in contact hole shrinking with binary block copolymer/homopolymer blending
3. Elaborate design of distinctive 3D flower-like M-Ti3C2Tx@SnS@C heterostructures with structure control and surface modification as promising microwave absorbers
4. Focused solar annealing for block copolymer fast self-assembly
5. In-plane ferroelectric-reconfigured interface towards dual-modal intelligent vision
6. Embedment of hollow SiO2 spheres into flower-like Ti3C2Tx MXene framework with decoration of carbon for efficient microwave absorption
7. Elaborately designed 3D honeycomb M−Ti3C2Tx@MoS2@C heterostructures as advanced microwave absorbers
8. A novel programming circuit for memristors
9. Stochastic Computing Hardware Design and Optimization for Convolutional Neutral Networks
10. Molecular ferroelectric/semiconductor interfacial memristors for artificial synapses
11. Co decoration of molybdenum sulfide and carbon for improving lithium ion capacity of large monolayer MXene cathodes
12. A Novel Programming Circuit for Memristors
13. CsPbBr3 Perovskite Quantum Dots Embedded in Polystyrene-poly2-vinyl Pyridine Copolymer for Robust and Light-Tunable Memristors
14. Boundary-directed epitaxy of block copolymers
15. Tailoring high mechanical performances of self‐healable poly(vinyl alcohol)‐based elastomers via judicious grafting of side chains
16. Elaborately Designed 3d Honeycomb M-Ti3c2tx@Mos2@C Heterostructures as Advanced Microwave Absorbers
17. An Accurate and Time-Efficient Subtractor by Cross Format Coding in Stochastic Computing
18. CsPbBr3 Perovskite Quantum Dots Embedded in Polystyrene-poly2-vinyl Pyridine Copolymer for Robust and Light-Tunable Memristors.
19. Measurement and Calculation Method for Sub-20 nm Line and DSA Patterns
20. A Via/Contact Layout Decomposition Method for Directed Self-Assembly Based on Local Optimization
21. A Generation solving Layout Decomposition Method for DSA-MP Hybrid Lithography
22. Improved Processing Window of Contact Hole with Directed Self-Assembly of Block Copolymer Blends
23. Large‐Area Flexible Memory Arrays of Oriented Molecular Ferroelectric Single Crystals with Nearly Saturated Polarization
24. Concentrated Solar Induced Graphene
25. Deep Dive into Lattice Dynamics and Phonon Anharmonicity for Intrinsically Low Thermal Expansion Coefficient in CuS
26. Dewetting‐Assisted Patterning of Organic Semiconductors for Micro‐OLED Arrays with a Pixel Size of 1 µm
27. Fabrication of Nanodevices Through Block Copolymer Self-Assembly
28. 亚十纳米导向自组装与深紫外混合光刻技术
29. MonkeyPosekit: Automated Markerless 2D Pose Estimation of Monkey
30. Block-Clustering on Neural Networks for Large-scale Memristor-based Implementation
31. Self-Aligned Assembly of a Poly(2-vinylpyridine)-b-Polystyrene-b-Poly(2-vinylpyridine) Triblock Copolymer on Graphene Nanoribbons
32. Highly Luminescent and Patternable Block Copolymer Templated 3D Perovskite Films
33. Electron Beam Lithography: CO 2 ‐Based Dual‐Tone Resists for Electron Beam Lithography (Adv. Funct. Mater. 13/2021)
34. 亚十纳米导向自组装与深紫外混合光刻技术
35. Nanotube network arrays with nickel oxide canopies as flexible high-energy anodes for lithium storage
36. CO2‐Based Dual‐Tone Resists for Electron Beam Lithography
37. Roadmap on emerging hardware and technology for machine learning
38. Directed self-assembly of block copolymers for sub-10 nm fabrication
39. Three-Dimensional PrGO-Based Sandwich Composites With MoS2 Flowers as Stuffings for Superior Lithium Storage
40. Combining double patterning with self-assembled block copolymer lamellae to fabricate 10.5 nm full-pitch line/space patterns
41. A method of improving spatial resolution in X-ray fluorescence holography
42. CO2‐Based Dual‐Tone Resists for Electron Beam Lithography.
43. Enhanced microphase separation of thin films of low molecular weight block copolymer by the addition of an ionic liquid
44. Sub-10 nm silicon FinFET devices on SOI substrate made by block copolymer lithography
45. The Solvent Distribution Effect on the Self-Assembly of Symmetric Triblock Copolymers during Solvent Vapor Annealing
46. Roadmap on emerging hardware and technology for machine learning.
47. Pathways to Mesoporous Resin/Carbon Thin Films with Alternating Gyroid Morphology
48. The One‐Pot Directed Assembly of Cylinder‐Forming Block Copolymer on Adjacent Chemical Patterns for Bimodal Patterning
49. Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat
50. Directed Self-Assembly of Polystyrene-b-poly(propylene carbonate) on Chemical Patterns via Thermal Annealing for Next Generation Lithography
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