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6. Viral Hepatitis and Liver Diseases in Mongolia

Author

Baatarkhuu, Oidov, primary, Uugantsetseg, G, additional, Munkh-Orshikh, D, additional, Naranzul, N, additional, Badamjav, S, additional, Tserendagva, D, additional, Amarsanaa, J, additional, and Young, Kim Do, additional

Published
2017
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9. CVD Growth Kinetics of HfB2 Thin Films from the Single-Source Precursor Hf(BH4)4

Author

Yang, Yu, Jayaraman, Sreenivas, Young Kim, Do, S. Girolami, Gregory, and R. Abelson, John

Abstract

Thermal CVD from the single-source precursor Hf(BH4)4affords stoichiometric, dense, and hard HfB2films; this paper reports the growth kinetics in detail. The decomposition reaction starts at 200 °C; mass spectrometry of the material desorbing from the growth surface reveals that, for steady-state deposition at P≤ 1 × 10-6Torr, the reaction probability of the precursor is independent of flux and increases with temperature with an apparent activation energy of 0.43 eV. The precursor is less reactive on clean Si and SiO2substrates than it is on the HfB2growth surface. By analyzing the thickness profile of films grown on high-aspect-ratio trench structures, we find that the growth rate is proportional to P0.3for 1 × 10-420:1 aspect ratio) can be obtained at low growth temperatures (≤300 °C) and high precursor pressures (∼0.1 Torr) with high growth rates (>200 nm/min).

Published
2006
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