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2. High Threshold Voltage Uniformity and Low Hysteresis Recessed-Gate Al2O3/AlN/GaN MISFET by Selective Area Growth

3. The breakdown behavior of GaN epitaxial material on silicon

6. Influence of interface contamination on transport properties of two-dimensional electron gas in selective area growth AlGaN/GaN heterostructure

10. Influence of the carbon-doping location on the material and electrical properties of a AlGaN/GaN heterostructure on Si substrate

11. The suppression of background doping in selective area growth technique for high performance normally-off AlGaN/GaN MOSFET

13. Current transport mechanism of AlGaN/GaN Schottky barrier diode with fully recessed Schottky anode

14. Investigation of O3-Al2O3/H2O-Al2O3 dielectric bilayer deposited by atomic-layer deposition for GaN MOS capacitors.

15. Investigation of O3‐Al2O3/H2O‐Al2O3dielectric bilayer deposited by atomic‐layer deposition for GaN MOS capacitors

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