35 results on '"Zou, Chunli"'
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2. A quantitative proteomic study reveals oxidative stress and synapse-related proteins contributed to TDCIPP exposure induced neurotoxicity
3. Enhancing fluid classification using meta-learning and transformer through small-sample drilling data to interpret well logging data.
4. Preparation of a novel catalyst (SoFeIII) and its catalytic performance towards the removal rate of sapphire substrate during CMP process
5. Atomically smooth gallium nitride surface prepared by chemical-mechanical polishing with S2O82−-Fe2+ based slurry
6. Investigation on the variation of the step-terrace structure on the surface of polished GaN wafer
7. Characterization of sapphire chemical mechanical polishing performances using silica with different sizes and their removal mechanisms
8. A non-noble material cathode catalyst dual-doped with sulfur and nitrogen as efficient electrocatalysts for oxygen reduction reaction
9. Fe-Nx/C assisted chemical–mechanical polishing for improving the removal rate of sapphire
10. Investigation on the surface characterization of Ga-faced GaN after chemical-mechanical polishing
11. XPS, UV–vis spectroscopy and AFM studies on removal mechanisms of Si-face SiC wafer chemical mechanical polishing (CMP)
12. Characterization of colloidal silica abrasives with different sizes and their chemical–mechanical polishing performance on 4H-SiC (0 0 0 1)
13. Synthesis of dual-doped non-precious metal electrocatalysts and their electrocatalytic activity for oxygen reduction reaction
14. Extended study of the atomic step-terrace structure on hexagonal SiC (0 0 0 1) by chemical-mechanical planarization
15. Automatic Pancreatic Ductal Adenocarcinoma Detection in Whole Slide Images Using Deep Convolutional Neural Networks
16. Preparation of bioactive calcium phosphate coating on porous C/C substrate by a novel deposition technique
17. The Deterioration Characteristics and Mechanism of Polishing Pads in Chemical Mechanical Polishing of Fused Silica
18. An in situ study of chemical-mechanical polishing behaviours on sapphire (0001) via simulating the chemical product-removal process by AFM-tapping mode in both liquid and air environments
19. Study on Pad Performance Deterioration in Chemical Mechanical Polishing (CMP) of Fused Silica
20. Chemical Mechanical Polishing (CMP) of SiC Wafer Using Photo-Catalyst Incorporated Pad
21. CMP of GaN using sulfate radicals generated by metal catalyst
22. AFM and XPS studies on material removal mechanism of sapphire wafer during chemical mechanical polishing (CMP)
23. A study of chemical products formed on sapphire (0001) during chemical–mechanical polishing
24. The effects of ultra-smooth surface atomic step morphology on CMP performances of sapphire and SiC wafers
25. Atomically smooth gallium nitride surfaces generated by chemical mechanical polishing with non-noble metal catalyst(Fe-Nx/C) in acid solution
26. Preparation of High-Purity (–)-Borneol and Xanthoxylin from Leaves ofBlumea balsamifera(L.) DC.
27. Investigation on defect control for final chemical mechanical polishing of aluminum alloy
28. Atomically smooth gallium nitride surface prepared by chemical-mechanical polishing with different abrasives
29. Effect of Modified Silica Abrasive Particles on Nanosized Particle Deposition in Final Polishing of Silicon Wafers
30. Extended study of the atomic step-terrace structure on hexagonal SiC (0001) by chemical-mechanical planarization
31. Chemical mechanical polishing (CMP) of on-axis Si-face 6H-SiC wafer for obtaining atomically flat defect-free surface
32. Investigation of CMP on GaN substrate for led manufacturing.
33. Preparation of High-Purity (–)-Borneol and Xanthoxylin from Leaves of Blumea balsamifera (L.) DC.
34. Effects of silica abrasive size on sapphire CMP performances and their removal mechanisms.
35. A study of surface defects of GaN during CMP process.
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