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4 results on '"desorption and decomposition"'

1. Thermal Stability of Octadecyltrichlorosilane and Perfluorooctyltriethoxysilane Monolayers on SiO2

Author

Xiangdong Yang, Haitao Wang, Peng Wang, Xuxin Yang, and Hongying Mao

Subjects
thermal stability, self-assembled monolayers, desorption and decomposition, electronic structures, Chemistry, QD1-999
Abstract

Using in situ ultraviolet photoelectron spectroscopy (UPS) and X-ray photoelectron spectroscopy (XPS) measurements, the thermal behavior of octadecyltrichlorosilane (OTS) and 1H, 1H, 2H, and 2H-perfluorooctyltriethoxysilane (PTES) monolayers on SiO2 substrates has been investigated. OTS is thermally stable up to 573 K with vacuum annealing, whereas PTES starts decomposing at a moderate temperature between 373 K and 423 K. Vacuum annealing results in the decomposition of CF3 and CF2 species rather than desorption of the entire PTES molecule. In addition, our UPS results reveal that the work function (WF)of OTS remains the same after annealing; however WF of PTES decreases from ~5.62 eV to ~5.16 eV after annealing at 573 K.

Published
2020
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2. Thermal Stability of Octadecyltrichlorosilane and Perfluorooctyltriethoxysilane Monolayers on SiO2

Author

Xiang Dong Yang, HaiTao Wang, Peng Wang, Hongying Mao, and Xu Xin Yang

Subjects
Materials science, Annealing (metallurgy), General Chemical Engineering, Analytical chemistry, 02 engineering and technology, 010402 general chemistry, 01 natural sciences, thermal stability, electronic structures, lcsh:Chemistry, chemistry.chemical_compound, X-ray photoelectron spectroscopy, Desorption, Monolayer, General Materials Science, Thermal stability, Work function, self-assembled monolayers, 021001 nanoscience & nanotechnology, Octadecyltrichlorosilane, 0104 chemical sciences, desorption and decomposition, chemistry, lcsh:QD1-999, 0210 nano-technology, Ultraviolet photoelectron spectroscopy
Abstract

Using in situ ultraviolet photoelectron spectroscopy (UPS) and X-ray photoelectron spectroscopy (XPS) measurements, the thermal behavior of octadecyltrichlorosilane (OTS) and 1H, 1H, 2H, and 2H-perfluorooctyltriethoxysilane (PTES) monolayers on SiO2 substrates has been investigated. OTS is thermally stable upto 573K with vacuum annealing, whereasPTES starts decomposing at a moderate temperature between 373 K and 423K. Vacuum annealing results in the decomposition of CF3 and CF2 species rather than desorption of the entire PTES molecule. In addition, our UPS results reveal that the work function (WF)of OTS remains the same after annealing, however WF of PTES decreases from ~5.62 eV to ~5.16 eV after annealing at 573K.

Published
2020

3. Thermal Stability of Octadecyltrichlorosilane and Perfluorooctyltriethoxysilane Monolayers on SiO

Author

Xiang Dong, Yang, Hai Tao, Wang, Peng, Wang, Xu Xin, Yang, and Hong Ying, Mao

Subjects
self-assembled monolayers, Article, thermal stability, desorption and decomposition, electronic structures
Abstract

Using in situ ultraviolet photoelectron spectroscopy (UPS) and X-ray photoelectron spectroscopy (XPS) measurements, the thermal behavior of octadecyltrichlorosilane (OTS) and 1H, 1H, 2H, and 2H-perfluorooctyltriethoxysilane (PTES) monolayers on SiO2 substrates has been investigated. OTS is thermally stable up to 573 K with vacuum annealing, whereas PTES starts decomposing at a moderate temperature between 373 K and 423 K. Vacuum annealing results in the decomposition of CF3 and CF2 species rather than desorption of the entire PTES molecule. In addition, our UPS results reveal that the work function (WF)of OTS remains the same after annealing; however WF of PTES decreases from ~5.62 eV to ~5.16 eV after annealing at 573 K.

Published
2019

4. Thermal Stability of Octadecyltrichlorosilane and Perfluorooctyltriethoxysilane Monolayers on SiO2.

Author

Yang, Xiangdong, Wang, Haitao, Wang, Peng, Yang, Xuxin, and Mao, Hongying

Subjects
*THERMAL stability, *X-ray photoelectron spectroscopy, *PHOTOELECTRON spectroscopy, *ULTRAVIOLET spectroscopy, *ELECTRON work function, *MONOMOLECULAR films, *THERMAL desorption
Abstract

Using in situ ultraviolet photoelectron spectroscopy (UPS) and X-ray photoelectron spectroscopy (XPS) measurements, the thermal behavior of octadecyltrichlorosilane (OTS) and 1H, 1H, 2H, and 2H-perfluorooctyltriethoxysilane (PTES) monolayers on SiO2 substrates has been investigated. OTS is thermally stable up to 573 K with vacuum annealing, whereas PTES starts decomposing at a moderate temperature between 373 K and 423 K. Vacuum annealing results in the decomposition of CF3 and CF2 species rather than desorption of the entire PTES molecule. In addition, our UPS results reveal that the work function (WF)of OTS remains the same after annealing; however WF of PTES decreases from ~5.62 eV to ~5.16 eV after annealing at 573 K. [ABSTRACT FROM AUTHOR]

Published
2020
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