1. Band alignment in Zn(1−x)MgxO:Al/SiOx/Si heterostructures for photovoltaic applications realized by atomic layer deposition: Effects of Al doping and Mg alloying.
- Author
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Schifano, R., Gieraltowska, S., Kurek, J., Wachnicki, L., Rehman, U., Budiakivska, D., Chusnutdinow, S., Kopalko, K., Porro, S., Jakiela, R., Minikayev, R., Witkowski, B. S., Pawlowski, M., Jastrzebski, C., and Thøgersen, A.
- Subjects
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SCANNING transmission electron microscopy , *ATOMIC layer deposition , *CONDUCTION bands , *COMPOUND semiconductors , *VALENCE bands , *OPEN-circuit voltage - Abstract
In this work, the impact of Al doping and Mg alloying on the conduction band misalignment (Δ E C) between ZnO and (100) Si with a SiO x interlayer was studied by combining capacitance vs voltage, Hall and x-ray diffraction measurements, energy-dispersive x-ray spectroscopy, secondary mass spectrometry, and high-resolution scanning transmission electron microscopy. To decouple the effect of the high carrier density in the ZnO-based layers due to the Al introduction, the measured Δ E C was corrected for the conduction band lowering effect taking into account the conduction band non-parabolicity of ZnO. Then, from the Mg content dependence, using the interface-induced gap states approach, branch point energies referred to the valence band maximum equal to (2.7 ± 0.2) and (3.6 ± 0.4) eV were extracted for ZnO and MgO, respectively. These branch point energies were obtained under the assumption of a linear variation between the respective values of the corresponding two binary compound semiconductors, ZnO and MgO, and taking into account the presence of the SiO x interlayer. Furthermore, in the case of the undoped Zn 0.96 Mg 0.04 O layers, a ∼ 0.27 eV reduced Δ E C was found, with the difference with respect to Zn 0.94 Mg 0.06 O:Al attributed to the presence of a downward band bending toward the interface with SiO x. Full 1 × 1 cm test solar cells based on Zn 0.8 Mg 0.2 O:Al layers exhibited short circuit currents, open circuit voltages, fill factors, and efficiencies that varied in the (28 ± 1) mA / cm 2 , (430 ± 20) mV, (61 ± 2) %, and (7.2 ± 0.3) % ranges with the residual Δ E C ∼ 0.6 eV being among the main causes of the reduced device performances. [ABSTRACT FROM AUTHOR]
- Published
- 2024
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