157 results on '"van Setten, Eelco"'
Search Results
2. Exploring the limits of high contrast contact imaging using split pupil exposures in high-NA EUV lithography
3. Improving EUV sub-40nm via single patterning using wavefront and pupil co-optimization
4. Holistic assessment and control of total CDU
5. Enabling the next step for on-product performance with high-NA EUV system
6. Stitching for high-NA: zooming in on CDU budget
7. Curvilinear mask embodiment for high NA: an imaging perspective
8. Reducing systematic LCDU of dense contact hole arrays on wafer via source optimization
9. Mask roughness contribution to wafer edge placement error
10. Overview of stitching for high NA: imaging and overlay experimental and simulation results
11. Evolutionary step in EUV technology with high NA
12. High-NA EUV imaging: the quest for resolution, depth-of-focus, and productivity
13. Stitching for High NA: new insights and path forward
14. The EUV mask as a system: function breakdown and interface description
15. EUV mask absorber induced best focus shifts
16. Overview of stitching for high NA: imaging and overlay experimental and simulation results
17. Pathfinding the perfect EUV mask: understanding the EUV mask using the hybrid mask model
18. High-NA EUV imaging: from system introduction towards low-k1 extension
19. High-NA EUVL exposure tool: key advantages and program status
20. Investigation of waveguide modes in EUV mask absorbers
21. High-NA EUV lithography exposure tool: key advantages and program progress
22. High-NA EUV lithography exposure tool: advantages and program progress
23. Multilayer optimization for high-NA EUV mask3D suppression
24. Fundamental understanding and experimental verification of bright versus dark field imaging
25. Experimental verification of high-NA imaging simulations using SHARP
26. Spectral purity performance of high-power EUV systems
27. Pathfinding the perfect EUV mask: the role of the multilayer
28. High-NA EUV lithography exposure tool: program progress
29. High-NA EUV Lithography exposure tool: program progress and mask impact (Conference Presentation)
30. High-NA EUV imaging: challenges and outlook
31. Lithographic effects due to particles on high-NA EUV mask pellicle
32. 3D mask effects in high NA EUV imaging
33. High NA EUV lithography: Next step in EUV imaging
34. High-NA EUV lithography exposure tool progress
35. High-NA EUV lithography exposure tool progress (Conference Presentation)
36. High-NA EUV lithography: The next step in EUV imaging (Conference Presentation)
37. Alternative absorber materials for mitigation of mask 3D effects in high NA EUV lithography
38. Simulation study of illumination effects in high-NA EUV lithography
39. Lithographic effects due to particles on High NA EUV mask pellicle.
40. High-NA EUV imaging: challenges and outlook.
41. The future of EUV lithography: continuing Moore's Law into the next decade
42. Edge placement error control and Mask3D effects in High-NA anamorphic EUV lithography
43. EUV source optimization driven by fundamental diffraction considerations
44. High-NA EUV lithography enabling Moore’s law in the next decade
45. High NA EUV lithography: Next step in EUV imaging.
46. 3D Mask Effects in High NA EUV Imaging.
47. Simulation study of illumination effects in high-NA EUV lithography.
48. Stitching for high-NA: zooming in on CDU budget.
49. Focus sensing using placement and CD variation for high NA EUV lithography
50. Improving EUV sub-40nm via single patterning using wavefront and pupil co-optimization
Catalog
Books, media, physical & digital resources
Discovery Service for Jio Institute Digital Library
For full access to our library's resources, please sign in.