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KLL Dielectronic Recombination of Highly Charged Sulfur and Silicon Ions.

Authors :
Ali, Safdar
Source :
Journal of Atomic & Molecular Physics. 2014, p1-5. 5p.
Publication Year :
2014

Abstract

Dielectronic recombination measurements for highly charged ions were performed at the Stockholm refrigerated electron beam ion trap. We have obtained KLL DR resonance strengths for highly charged H- and He-like sulfur and silicon ions. The experimental results are compared with the theoretical data obtained from GRASP II code. Both the experimental and calculated results agree well within the experimental error bars. Moreover, the dielectronic recombination resonance strengths are used to obtain the new scaling parameters by incorporating our results with the previous measurements and to check the behaviour of scaling formula for H- and He-like isoelectronic sequences. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
23148039
Database :
Academic Search Index
Journal :
Journal of Atomic & Molecular Physics
Publication Type :
Academic Journal
Accession number :
100468210
Full Text :
https://doi.org/10.1155/2014/752934