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Nanopatterned Silicon Substrate Use in Heterojunction Thin Film Solar Cells Made by Magnetron Sputtering.
- Source :
-
International Journal of Photoenergy . 2014, p1-10. 10p. - Publication Year :
- 2014
-
Abstract
- This paper describes a method for fabricating silicon heterojunction thin film solar cells with an ITO/p-type a-Si : H/n-type cSi structure by radiofrequency magnetron sputtering. A short-circuit current density and efficiency of 28.80 mA/cm² and 8.67% were achieved. Novel nanopatterned silicon wafers for use in cells are presented. Improved heterojunction cells are formed on a nanopatterned silicon substrate that is prepared with a self-assembled monolayer of SiO2 nanospheres with a diameter of 550 nm used as an etching mask. The efficiency of the nanopattern silicon substrate heterojunction cells was 31.49% greater than that of heterojunction cells on a flat silicon wafer. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 1110662X
- Database :
- Academic Search Index
- Journal :
- International Journal of Photoenergy
- Publication Type :
- Academic Journal
- Accession number :
- 100518446
- Full Text :
- https://doi.org/10.1155/2014/707543