Cite
Si[sub 0.85]Ge[sub 0.15] oxynitridation in nitric oxide/nitrous oxide ambient.
MLA
Dasgupta, Anindya, et al. “Si[Sub 0.85]Ge[Sub 0.15] Oxynitridation in Nitric Oxide/Nitrous Oxide Ambient.” Journal of Applied Physics, vol. 94, no. 1, July 2003, p. 716. EBSCOhost, https://doi.org/10.1063/1.1576489.
APA
Dasgupta, A., Takoudis, C. G., Lei, Y., & Browning, N. D. (2003). Si[sub 0.85]Ge[sub 0.15] oxynitridation in nitric oxide/nitrous oxide ambient. Journal of Applied Physics, 94(1), 716. https://doi.org/10.1063/1.1576489
Chicago
Dasgupta, Anindya, Christos G. Takoudis, Yuanyuan Lei, and Nigel D. Browning. 2003. “Si[Sub 0.85]Ge[Sub 0.15] Oxynitridation in Nitric Oxide/Nitrous Oxide Ambient.” Journal of Applied Physics 94 (1): 716. doi:10.1063/1.1576489.