Matching a Nanosecond Pulse Source to a Streamer Corona Plasma Reactor With a DC Bias.

Matching a pulse source to a plasma load is one of the main challenges to overcome to maximize the full potential of pulsed discharges for air purification applications. In this paper, we propose experiments that investigate the matching of a nanosecond pulse source to a corona plasma reactor that is aided by a high voltage on a tertiary electrode. The corona plasma reactor is a wire-cylinder reactor, as is commonly used in pulsed power plasmas. A tertiary electrode is situated on a dielectric layer against the cylinder of the reactor. On this tertiary electrode, we can apply a pulsed RF or dc voltage to provide an additional plasma and bias voltage in the corona plasma reactor. The pulse source that energizes the main corona plasma is the nanosecond pulse source of Kumamoto University, Japan. In this paper, we show the results of experiments with a dc voltage on the tertiary electrode. We varied the amplitude of the pulsed voltage as well as the dc voltage and investigated their effect on the corona plasma with energy and ozone measurements. The results show that the matching to the reactor increases with increasing dc voltages. However, the matching effect decreases with higher repetition rates. Furthermore, ozone measurements confirmed that a better matching also results in a higher ozone production, but in a lower ozone production energy yield. [ABSTRACT FROM PUBLISHER]