Cite
Electro-chemical mechanical polishing of single-crystal SiC using CeO2 slurry.
MLA
Deng, Hui, et al. “Electro-Chemical Mechanical Polishing of Single-Crystal SiC Using CeO2 Slurry.” Electrochemistry Communications, vol. 52, Mar. 2015, pp. 5–8. EBSCOhost, https://doi.org/10.1016/j.elecom.2015.01.002.
APA
Deng, H., Hosoya, K., Imanishi, Y., Endo, K., & Yamamura, K. (2015). Electro-chemical mechanical polishing of single-crystal SiC using CeO2 slurry. Electrochemistry Communications, 52, 5–8. https://doi.org/10.1016/j.elecom.2015.01.002
Chicago
Deng, Hui, Kenji Hosoya, Yusuke Imanishi, Katsuyoshi Endo, and Kazuya Yamamura. 2015. “Electro-Chemical Mechanical Polishing of Single-Crystal SiC Using CeO2 Slurry.” Electrochemistry Communications 52 (March): 5–8. doi:10.1016/j.elecom.2015.01.002.