Cite
Centimeter-Scale Subwavelength Photolithography Using Metal-Coated Elastomeric Photomasks with Modulated Light Intensity at the Oblique Sidewalls.
MLA
Jin Wu, et al. “Centimeter-Scale Subwavelength Photolithography Using Metal-Coated Elastomeric Photomasks with Modulated Light Intensity at the Oblique Sidewalls.” Langmuir, vol. 31, no. 17, May 2015, pp. 5005–13. EBSCOhost, https://doi.org/10.1021/acs.langmuir.5b00568.
APA
Jin Wu, Yayuan Liu, Yuanyuan Guo, Feng, S., Binghua Zou, Hui Mao, Cheng-han Yu, Tian, D., Wei Huang, & Fengwei Huo. (2015). Centimeter-Scale Subwavelength Photolithography Using Metal-Coated Elastomeric Photomasks with Modulated Light Intensity at the Oblique Sidewalls. Langmuir, 31(17), 5005–5013. https://doi.org/10.1021/acs.langmuir.5b00568
Chicago
Jin Wu, Yayuan Liu, Yuanyuan Guo, Shuanglong Feng, Binghua Zou, Hui Mao, Cheng-han Yu, Danbi Tian, Wei Huang, and Fengwei Huo. 2015. “Centimeter-Scale Subwavelength Photolithography Using Metal-Coated Elastomeric Photomasks with Modulated Light Intensity at the Oblique Sidewalls.” Langmuir 31 (17): 5005–13. doi:10.1021/acs.langmuir.5b00568.