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First principles-based multiparadigm, multiscale strategy for simulating complex materials processes with applications to amorphous SiC films.

Authors :
Naserifar, Saber
Goddard III, William A.
Tsotsis, Theodore T.
Sahimi, Muhammad
Source :
Journal of Chemical Physics. 2015, Vol. 142 Issue 17, p1-14. 14p. 2 Charts, 16 Graphs.
Publication Year :
2015

Abstract

Progress has recently been made in developing reactive force fields to describe chemical reactions in systems too large for quantum mechanical (QM) methods. In particular, ReaxFF, a force field with parameters that are obtained solely from fitting QM reaction data, has been used to predict structures and properties of many materials. Important applications require, however, determination of the final structures produced by such complex processes as chemical vapor deposition, atomic layer deposition, and formation of ceramic films by pyrolysis of polymers. This requires the force field to properly describe the formation of other products of the process, in addition to yielding the final structure of the material. We describe a strategy for accomplishing this and present an example of its use for forming amorphous SiC films that have a wide variety of applications. Extensive reactive molecular dynamics (MD) simulations have been carried out to simulate the pyrolysis of hydridopolycarbosilane. The reaction products all agree with the experimental data. After removing the reaction products, the system is cooled down to room temperature at which it produces amorphous SiC film, for which the computed radial distribution function, x-ray diffraction pattern, and the equation of state describing the three main SiC polytypes agree with the data and with the QM calculations. Extensive MD simulations have also been carried out to compute other structural properties, as well the effective diffusivities of light gases in the amorphous SiC film. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00219606
Volume :
142
Issue :
17
Database :
Academic Search Index
Journal :
Journal of Chemical Physics
Publication Type :
Academic Journal
Accession number :
102584539
Full Text :
https://doi.org/10.1063/1.4919797