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A step towards accreditation: A robustness test of etching process.

Authors :
Leonardi, F.
Veschetti, M.
Tonnarini, S.
Cardellini, F.
Trevisi, R.
Source :
Applied Radiation & Isotopes. Aug2015, Vol. 102, p93-97. 5p.
Publication Year :
2015

Abstract

In the present study the robustness of the etching process used by our laboratory was assessed. The strategy followed was based on the procedure suggested by Youden. Critical factors for the process were estimated using both Lenth's method and Dong's algorithm. The robustness test evidences that particular attention needs to be paid to the control of the etching solution's temperature. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
09698043
Volume :
102
Database :
Academic Search Index
Journal :
Applied Radiation & Isotopes
Publication Type :
Academic Journal
Accession number :
102956055
Full Text :
https://doi.org/10.1016/j.apradiso.2015.05.002