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A step towards accreditation: A robustness test of etching process.
- Source :
-
Applied Radiation & Isotopes . Aug2015, Vol. 102, p93-97. 5p. - Publication Year :
- 2015
-
Abstract
- In the present study the robustness of the etching process used by our laboratory was assessed. The strategy followed was based on the procedure suggested by Youden. Critical factors for the process were estimated using both Lenth's method and Dong's algorithm. The robustness test evidences that particular attention needs to be paid to the control of the etching solution's temperature. [ABSTRACT FROM AUTHOR]
- Subjects :
- *ROBUST control
*ETCHING
*ALGORITHMS
*TEMPERATURE effect
*CHEMICAL processes
Subjects
Details
- Language :
- English
- ISSN :
- 09698043
- Volume :
- 102
- Database :
- Academic Search Index
- Journal :
- Applied Radiation & Isotopes
- Publication Type :
- Academic Journal
- Accession number :
- 102956055
- Full Text :
- https://doi.org/10.1016/j.apradiso.2015.05.002