Cite
Sensitivity analysis and line edge roughness determination of 28-nm pitch silicon fins using Mueller matrix spectroscopic ellipsometry-based optical critical dimension metrology.
MLA
Dixit, Dhairya, et al. “Sensitivity Analysis and Line Edge Roughness Determination of 28-Nm Pitch Silicon Fins Using Mueller Matrix Spectroscopic Ellipsometry-Based Optical Critical Dimension Metrology.” Journal of Micro/Nanolithography, MEMS & MOEMS, vol. 14, no. 3, July 2015, pp. 1–13. EBSCOhost, https://doi.org/10.1117/1.JMM.14.3.031208.
APA
Dixit, D., O’Mullane, S., Sunkoju, S., Gottipati, A., Hosler, E. R., Kamineni, V., Preil, M., Keller, N., Race, J., Muthinti, G. R., & Diebold, A. C. (2015). Sensitivity analysis and line edge roughness determination of 28-nm pitch silicon fins using Mueller matrix spectroscopic ellipsometry-based optical critical dimension metrology. Journal of Micro/Nanolithography, MEMS & MOEMS, 14(3), 1–13. https://doi.org/10.1117/1.JMM.14.3.031208
Chicago
Dixit, Dhairya, Samuel O’Mullane, Sravan Sunkoju, Abhishek Gottipati, Erik R. Hosler, Vimal Kamineni, Moshe Preil, et al. 2015. “Sensitivity Analysis and Line Edge Roughness Determination of 28-Nm Pitch Silicon Fins Using Mueller Matrix Spectroscopic Ellipsometry-Based Optical Critical Dimension Metrology.” Journal of Micro/Nanolithography, MEMS & MOEMS 14 (3): 1–13. doi:10.1117/1.JMM.14.3.031208.