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Fin-Enabled-Area-Scaled Tunnel FET.
- Source :
-
IEEE Transactions on Electron Devices . Oct2015, Vol. 62 Issue 10, p3184-3191. 8p. - Publication Year :
- 2015
-
Abstract
- While keeping the technological evolution and commercialization of FinFET technology in mind, this paper discloses a novel concept that enables area-scaled or vertical tunneling in Fin-based technologies. The concept provides a roadmap for beyond FinFET technologies, while enjoying the advantages of FinFET-like structure without demanding technological abruptness from the existing FinFET technology nodes to beyond FinFET nodes. The proposed device at 10-nm gate length, when compared with the conventional vertical tunneling FET or planar area-scaled device, offers 100% improvement in the ON-current, $15\times {}$ reduction in the OFF-current, $3\times {}$ increase in the transconductance, 30% improvement in the output resistance, 55% improvement in the unity gain frequency, and more importantly $6\times {}$ reduction in the footprint area for a given drive capability. Furthermore, the proposed device brings the average and minimum subthreshold slope down to 40 and 11 mV/decade at 10-nm gate length. This gives a path for beyond FinFET system-on-chip applications, while enjoying the analog, digital, and RF performance improvements. [ABSTRACT FROM PUBLISHER]
Details
- Language :
- English
- ISSN :
- 00189383
- Volume :
- 62
- Issue :
- 10
- Database :
- Academic Search Index
- Journal :
- IEEE Transactions on Electron Devices
- Publication Type :
- Academic Journal
- Accession number :
- 109904221
- Full Text :
- https://doi.org/10.1109/TED.2015.2469678