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ITEM: A temperature-dependent electromigration reliability...

Authors :
Teng, Chin-Chi
Cheng, Yi-Kan
Rosenbaum, Elyse
Sung-Mo Kang
Source :
IEEE Transactions on Computer-Aided Design of Integrated Circuits & Systems. Aug97, Vol. 16 Issue 8, p882. 12p. 16 Diagrams, 1 Chart, 9 Graphs.
Publication Year :
1997

Abstract

Presents an electromigration reliability diagnosis tool (iTEM) for complementary metal oxide semiconductor (CMOS) very-large scale integration (VLSI) circuits. Temperature effect on electromigration reliability; Block diagram of iTEM; Results of electrothermal timing simulation.

Details

Language :
English
ISSN :
02780070
Volume :
16
Issue :
8
Database :
Academic Search Index
Journal :
IEEE Transactions on Computer-Aided Design of Integrated Circuits & Systems
Publication Type :
Academic Journal
Accession number :
113852
Full Text :
https://doi.org/10.1109/43.644613