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Removal of B from Si by Hf addition during Al–Si solvent refining process.

Authors :
Lei, Yun
Ma, Wenhui
Sun, Luen
Wu, Jijun
Dai, Yongnian
Morita, Kazuki
Source :
Science & Technology of Advanced Materials. Dec2016, Vol. 17 Issue 1, p12-19. 8p.
Publication Year :
2016

Abstract

A small amount of Hf was employed as a new additive to improve B removal in the electromagnetic solidification refinement of Si with an Al–Si melt, because Hf has a very strong affinity for B. The segregation ratio of Hf between the solid Si and Al–Si melt was estimated to range from 4.9 × 10−6to 8.8 × 10−7for Al concentrations of 0 to 64 at.%, respectively. The activity coefficient of Hf in solid Si at its infinite dilution was also estimated. A small addition of Hf (<1025 parts per million atoms, ppma) significantly improved the B removal. It was confirmed that the use of an increased Hf addition, slower cooling rate, and Al-rich Al–Si melt as the refining solvent removed B more efficiently. B in Si could be removed as much as 98.2% with 410 ppma Hf addition when the liquidus temperature of the Al–Si melt was 1173 K and the cooling rate was 4.5–7.6 K min–1. The B content in Si could be controlled from 153 ppma to 2.7 ppma, which meets the acceptable level for solar-grade Si. [ABSTRACT FROM PUBLISHER]

Subjects

Subjects :
*BORON
*SILICON
*HYDROGEN fluoride

Details

Language :
English
ISSN :
14686996
Volume :
17
Issue :
1
Database :
Academic Search Index
Journal :
Science & Technology of Advanced Materials
Publication Type :
Academic Journal
Accession number :
120394299
Full Text :
https://doi.org/10.1080/14686996.2016.1140303