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Effect of sputtering target power on microstructure and mechanical properties of nanocomposite nc-TiN/a-SiNx thin films
- Source :
-
Thin Solid Films . Jan2004, Vol. 447/448, p462. 6p. - Publication Year :
- 2004
-
Abstract
- Nanocrystalline TiN has been imbedded in amorphous silicon nitride matrix to form a super hard nanocomposite thin film (nc-TiN/a-SiNx) via magnetron sputtering. Adjusting Ti and Si3N4 target power ratio altered film composition, size, amount and distribution of the nc-TiN phase. At a Ti target power density of 5.5 W cm−2, the Ti to Si3N4 target power ratio should be greater than unity in order for nc-TiN to form, otherwise, Ti will dissolve in amorphous SiNx. The relationship between the film hardness and the crystallite size show Hall–Petch and anti-Hall–Petch relationship. A ‘scratch crack propagation resistance’ parameter, or CPRs=Lc1(Lc2−Lc1), has been proposed to approximate thin film toughness from the critical load data easily obtained from a scratch adhesion test. [Copyright &y& Elsevier]
Details
- Language :
- English
- ISSN :
- 00406090
- Volume :
- 447/448
- Database :
- Academic Search Index
- Journal :
- Thin Solid Films
- Publication Type :
- Academic Journal
- Accession number :
- 12442664
- Full Text :
- https://doi.org/10.1016/S0040-6090(03)01125-8