Characterization of free-standing thin crystalline films on porous silicon for solar cells

Thin film monocrystalline silicon solar cells based on porous silicon (PS) layer transfer processes could be cost-effective because of their lower consumption of material use and the potential for high efficiency. The process is based on our ability to separate thin porous films (p+) of desired thickness and area from Si substrate. Crystallinity of these porous films is studied with XRD for their suitability for Si epitaxy. AFM is employed to study the Si substrate surface roughness after one or more porous film separations. The roughness stabilizes after four film separations. Annealing of the porous films at temperatures above 1050 °C results in a closed surface, suitable for Si epitaxy. XRD analysis of epitaxially deposited Si layer on annealed PS film revealed its high mono-crystalline quality. A FMS solar cell of 12% efficiency has been realized in an 18 μm thin epitaxial layer. [Copyright &y& Elsevier]