Back to Search Start Over

Study on adjacent radicals short contact interaction, spin density, overlap integral and strong anti-ferromagnetic coupling strength.

Authors :
Zheng, Lu-Yi
Chi, Yan-Hui
Shi, Jing-Min
Zhang, Cheng-Cheng
Chen, De-Zhan
Source :
Chemical Physics. Jun2018, Vol. 510, p10-16. 7p.
Publication Year :
2018

Abstract

Through theoretical calculations and magnetostructural study of nine radical compounds that exhibit strong anti-ferromagnetic coupling strength, it is revealed preliminarily that the overlap integral between adjacent radicals short contact atoms is relevant to associated strong anti-ferromagnetic coupling strength. It is also confirmed that spin density and overlap integral between adjacent radical short contact atoms are the two major factors that dominate intermolecular strong anti-ferromagnetic coupling strength. The study also reveals that the factor of the overlap integral can replace the factors of both interatomic short contact distance and slippage degrees of π-π stacking. The study also reveals for the first time that the overlap integral changes with different short contact atom and different central coordinated atom. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
03010104
Volume :
510
Database :
Academic Search Index
Journal :
Chemical Physics
Publication Type :
Academic Journal
Accession number :
130073307
Full Text :
https://doi.org/10.1016/j.chemphys.2018.05.005