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Improved wear resistance of WS2 film by LT-deposited Ti interlayer with ω phase structure.
- Source :
-
Vacuum . Sep2018, Vol. 155, p423-427. 5p. - Publication Year :
- 2018
-
Abstract
- The goal of this paper was to investigate the structural/mechanical properties of arc-ion-plated Ti film deposited at ultralow temperature (166 K, LT-Ti film) and its effect as an interlayer on the wear resistance of sputtered WS 2 film. The results revealed that the LT-Ti film mainly exhibited ω-phase structure due to the insufficient mobility of Ti adatoms at LT surface, while the α-phase was predominated in the Ti film deposited at room temperature (RT-Ti film). The LT-Ti film showed a higher hardness than the RT-Ti film as well as the better toughness and film-substrate adhesion on steel substrates. The wear resistance of sputtered WS 2 film could be significantly improved by employing the Ti films as its interlayer, especially for the LT-Ti film. [ABSTRACT FROM AUTHOR]
- Subjects :
- *WEAR resistance
*TITANIUM
*THIN film deposition
*TEMPERATURE effect
*HARDNESS
Subjects
Details
- Language :
- English
- ISSN :
- 0042207X
- Volume :
- 155
- Database :
- Academic Search Index
- Journal :
- Vacuum
- Publication Type :
- Academic Journal
- Accession number :
- 130889309
- Full Text :
- https://doi.org/10.1016/j.vacuum.2018.06.032