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Topological Transitions Induced by Antiferromagnetism in a Thin-Film Topological Insulator.

Authors :
Qing Lin He
Gen Yin
Luyan Yu
Grutter, Alexander J.
Lei Pan
Chui-Zhen Chen
Xiaoyu Che
Guoqiang Yu
Bin Zhang
Qiming Shao
Stern, Alexander L.
Casas, Brian
Jing Xia
Xiaodong Han
Kirby, Brian J.
Lake, Roger K.
Law, K. T.
Wang, Kang L.
Source :
Physical Review Letters. 8/31/2018, Vol. 121 Issue 9, p1-1. 1p.
Publication Year :
2018

Abstract

Magnetism in topological insulators (TIs) opens a topologically nontrivial exchange band gap, providing an exciting platform for manipulating the topological order through an external magnetic field. Here, we show that the surface of an antiferromagnetic thin film can magnetize the top and the bottom TI surface states through interfacial couplings. During the magnetization reversal, intermediate spin configurations are ascribed from unsynchronized magnetic switchings. This unsynchronized switching develops antisymmetric magnetoresistance spikes during magnetization reversals, which might originate from a series of topological transitions. With the high Néel ordering temperature provided by the antiferromagnetic layers, the signature of the induced topological transition persists up to ~90 K. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00319007
Volume :
121
Issue :
9
Database :
Academic Search Index
Journal :
Physical Review Letters
Publication Type :
Academic Journal
Accession number :
131625739
Full Text :
https://doi.org/10.1103/PhysRevLett.121.096802