Cite
Evolution, Challenges and Attributes of Near Micron Sized TaN Resistors for Mixed Signal IC Applications From a Lithography Perspective.
MLA
Brown, Tom, et al. “Evolution, Challenges and Attributes of Near Micron Sized TaN Resistors for Mixed Signal IC Applications From a Lithography Perspective.” IEEE Transactions on Semiconductor Manufacturing, vol. 31, no. 4, Nov. 2018, pp. 460–66. EBSCOhost, https://doi.org/10.1109/TSM.2018.2870569.
APA
Brown, T., Tiku, S., Kulkarni, S., & Singh, M. (2018). Evolution, Challenges and Attributes of Near Micron Sized TaN Resistors for Mixed Signal IC Applications From a Lithography Perspective. IEEE Transactions on Semiconductor Manufacturing, 31(4), 460–466. https://doi.org/10.1109/TSM.2018.2870569
Chicago
Brown, Tom, Shiban Tiku, Sarang Kulkarni, and Manjeet Singh. 2018. “Evolution, Challenges and Attributes of Near Micron Sized TaN Resistors for Mixed Signal IC Applications From a Lithography Perspective.” IEEE Transactions on Semiconductor Manufacturing 31 (4): 460–66. doi:10.1109/TSM.2018.2870569.