Structure and tribological behavior of (AlCrNbSiTiV)N film deposited using direct current magnetron sputtering and high power impulse magnetron sputtering.

Abstract Multi-element nitride films of AlCrNbSiTiV high-entropy alloy (HEAs) are deposited on a cermet cutter (T1200A) and glass substrates using reactive direct current magnetron sputtering (DCMS) and high power impulse magnetron sputtering (HIPIMS) with a single equimolar AlCrNbSiTiV HEA target. This study determines the effect of the ratio of the nitrogen flow (varying from 0 to 40%) on the chemical composition, microstructure, mechanical properties and cutting tool performance of the (AlCrNbSiTiV)N film. The films are found to have increased hardness and elastic recovery when the nitrogen flow ratio is increased. The (AlCrNbSiTiV)N film adheres well to the substrate and the Rockwell indentation results are HF1. (AlCrNbSiTiV)N films that are grown using DCMS and HIPIMS feature only a simple face-center-cubic structure. The samples that are deposited using HIPIMS exhibit a higher film density, a smoother surface and excellent hardness and elastic recovery, compared to coatings that are deposited using DCMS. The (AlCrNbSiTiV)N films are coated onto cutters for the dry turning of a SCM440 steel work-piece. The machining surface of a coated tool that is deposited using a HIPIMS system exhibits fewer surface defects and the tool flank wear is decreased. Highlights • TEM pattern of (AlCrNbSiTiV)N film shows a simple NaCl-type FCC phase. • Nitride films shows good adhesion strength to the substrate be classified as HF1. • The distribution of elements is homogeneous through the depth of the nitride film. • The films deposited with the HIPIMS are smoother, better crystallized and good mechanical property. [ABSTRACT FROM AUTHOR]