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Theoretical Study and Monte Carlo Simulation on the Dynamic Process of a Novel Multipacting Cathode for High-Current Diode.

Authors :
Dong, Ye
Liu, Qingxiang
Li, Xiangqiang
Zhou, Haijing
Dong, Zhiwei
Source :
IEEE Transactions on Plasma Science. Jun2018, Vol. 46 Issue 6, Part 1, p1929-1936. 8p.
Publication Year :
2018

Abstract

The prototype and configuration design of a novel multipacting cathode producing a ring-like electron beam for high-current diode are presented. The whole dynamic process of the moving secondary electron on the multipacting cathode surface is theoretically investigated and numerically simulated using the Monte Carlo method. The results indicate that the prototype of the novel multipacting cathode for high-current diode is feasible. Under the interactions of the applied electric field (~MV/m) in axial and radial directions and the guiding magnetic field (~T) in axial direction, the seed electrons from the triple junctions move with spiral advancing trajectories along axial direction. Electron number can be effectively increased by each impact on the coating surface with high secondary electron emission yield coefficient. This phenomenon will achieve electron current amplification with the ring-like electron beam output till multipacting enters into saturation. The simulated characteristic parameters of the secondary electron and the working range of the multipacting cathode agree with the theoretical results. Under the typical condition, the moving distance of the secondary electron is on the order of submillimeters, the fight time is on the order of picoseconds, and the spread speed is on the order of 106 to 107 m/s. In addition, the multipacting saturation mechanism is analyzed, and the emission current density is roughly estimated to ~kA/cm2. Enhancing the magnitude of applied electric field in radial direction can effectively improve the emission current density. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00933813
Volume :
46
Issue :
6, Part 1
Database :
Academic Search Index
Journal :
IEEE Transactions on Plasma Science
Publication Type :
Academic Journal
Accession number :
132684619
Full Text :
https://doi.org/10.1109/TPS.2018.2829720