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Structural and optical properties of sulfur passivated epitaxial step-graded GaAs1-ySby materials.

Authors :
Hudait, Mantu K.
Clavel, Michael B.
Saluru, Sarat
Liu, Jheng-Sin
Meeker, Michael A.
Khodaparast, Giti A.
Bodnar, Robert J.
Source :
AIP Advances. Nov2018, Vol. 8 Issue 11, pN.PAG-N.PAG. 18p.
Publication Year :
2018

Abstract

The impact of bulk and surface defect states on the vibrational and optical properties of step-graded epitaxial GaAs1-ySby (0 ≤ y ≤ 1) materials with and without chemical surface treatment by (NH4)2S was investigated. Tunable antimony (Sb) composition GaAs1-ySby epitaxial layers, grown by solid source molecular beam epitaxy (MBE), were realized on GaAs and Si substrates by varying key growth parameters (e.g., Sb/Ga flux ratio, growth temperature). Raman and photoluminescence (PL) spectroscopic analysis of (NH4)2S-treated GaAs1-ySby epitaxial layers revealed composition-independent Raman spectral widths and enhanced PL intensity (1.3×) following (NH4)2S surface treatment, indicating bulk defect-minimal epitaxy and a reduction in the surface recombination velocity corresponding to reduced surface defect sites, respectively. Moreover, quantification of the luminescence recombination mechanisms across a range of measurement temperatures and excitation intensities (i.e., varying laser power) indicate the presence of free-electron to neutral acceptor pair or Sb-defect-related recombination pathways, with detectable bulk defect recombination discernible only in binary GaSb PL spectra. In addition, PL analysis of the short- and long-term thermodynamic stability of sulfur-treated GaAs1-ySby/Al2O3 heterointerfaces revealed an absence of quantifiable atomic interdiffusion or native oxide formation. Leveraging the combined Raman and PL analysis herein, the quality of the heteroepitaxial step-graded epitaxial GaAs1-ySby materials can be optimized for optical devices. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
21583226
Volume :
8
Issue :
11
Database :
Academic Search Index
Journal :
AIP Advances
Publication Type :
Academic Journal
Accession number :
133317893
Full Text :
https://doi.org/10.1063/1.5028133