Static and Dynamic Oxide-Trapped- Charge-Induced Variability in Nanoscale CMOS Circuits.

The interdevice mismatch and intradevice temporal instability in the nanoscale CMOS circuits is examined from a unified point of view as a static and dynamic parts of the variability concerned with stochastic oxide charge trapping and detrapping. This approach has been benchmarked on the recent evidence of the radiation-induced increase of intertransistor mismatch in 60-nm ICs. A possible reliability limitation in ultrascale circuits concerned with the single or a few charged defect instability is pointed out and estimated. [ABSTRACT FROM AUTHOR]