Back to Search
Start Over
A Line Tunneling Field-Effect Transistor Based on Misaligned Core–Shell Gate Architecture in Emerging Nanotube FETs.
- Source :
-
IEEE Transactions on Electron Devices . Jun2019, Vol. 66 Issue 6, p2809-2816. 8p. - Publication Year :
- 2019
-
Abstract
- In this paper, a new architecture based on an intentional misalignment between the core and shell gate is presented for the nanotube tunnel field-effect transistor (NT-TFET). The misaligned core gate overlaps with the source region and facilitates line tunneling in the core-gate–source overlapped region significantly increasing the band-to-band tunneling (BTBT) rate. Using the calibrated 3-D simulations, we show that the proposed misaligned (MG) NT-TFET outperforms the conventional NT-TFET both in terms of static as well as dynamic performance. The MGNT-TFET exhibits an increased ON-state current by nearly 11 times as compared to the conventional NT-TFET with an ultrasteep subthreshold slope (minimum point subthreshold swing of ~5 mV/dec and an average subthreshold slope of 15.5 mV/dec). The higher effective drive current also leads to an improved dynamic performance in the MGNT-TFET [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 00189383
- Volume :
- 66
- Issue :
- 6
- Database :
- Academic Search Index
- Journal :
- IEEE Transactions on Electron Devices
- Publication Type :
- Academic Journal
- Accession number :
- 137270835
- Full Text :
- https://doi.org/10.1109/TED.2019.2910156