Back to Search Start Over

Intermodulation Linearity Characteristics of 14-nm RF FinFETs.

Authors :
Zhang, Jiabi
Niu, Guofu
Cai, Will
Wang, Weike
Imura, Kimihiko
Source :
IEEE Transactions on Electron Devices. Jun2019, Vol. 66 Issue 6, p2520-2526. 7p.
Publication Year :
2019

Abstract

This paper investigates the RF intermodulation characteristics of transistors from a 14-nm RF FinFET technology using experimental measurements, circuit simulation with Berkeley short-channel IGFET model-common multi-gate (BSIM-CMG), and Volterra series. Linearity sweet spots with respect to gate voltage and RF power, as well as its drain voltage dependence, are examined. Key BSIM-CMG model parameters required for simultaneous fitting of dc I–V, S-parameters, and intermodulation distortion are identified and demonstrated. Volterra series analysis shows that distortion resulting from ${V}_{\textsf {DS}}$ derivatives of ${I}_{\textsf {DS}}$ dominates at most biases. A minimum third-order intercept gate voltage ${V}_{\textsf {GS,IP3}}$ of 0.5 V is observed, compared with 0.7 V in a 28-nm high- ${k}$ metal-gate planar device. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
00189383
Volume :
66
Issue :
6
Database :
Academic Search Index
Journal :
IEEE Transactions on Electron Devices
Publication Type :
Academic Journal
Accession number :
137270868
Full Text :
https://doi.org/10.1109/TED.2019.2912516