Cite
The Effect of Carrier Gas and Reactor Pressure on Gallium Nitride Growth in MOCVD Manufacturing Process.
MLA
Jumaah, Omar, and Yogesh Jaluria. “The Effect of Carrier Gas and Reactor Pressure on Gallium Nitride Growth in MOCVD Manufacturing Process.” Journal of Heat Transfer, vol. 141, no. 8, Aug. 2019, pp. 1–12. EBSCOhost, https://doi.org/10.1115/1.4043895.
APA
Jumaah, O., & Jaluria, Y. (2019). The Effect of Carrier Gas and Reactor Pressure on Gallium Nitride Growth in MOCVD Manufacturing Process. Journal of Heat Transfer, 141(8), 1–12. https://doi.org/10.1115/1.4043895
Chicago
Jumaah, Omar, and Yogesh Jaluria. 2019. “The Effect of Carrier Gas and Reactor Pressure on Gallium Nitride Growth in MOCVD Manufacturing Process.” Journal of Heat Transfer 141 (8): 1–12. doi:10.1115/1.4043895.