Convex grid-patterned microstructures on silicon induced by femtosecond laser assisted with chemical etching.

• Convex grid-patterned microstructures are processed by fs laser and chemical etching. • According to Raman spectra, the formation of the microstructures is investigated. • The effect of experimental parameters on the microstructures' 3D size is discussed. • The hydrophobic property of a surface with such microstructures is explored. The convex grid-patterned microstructures were fabricated on a silicon substrate by using femtosecond laser assisted with chemical etching in this study. Along the femtosecond laser scanning traces, the isosceles trapezoidal microstructures were generated. According to Raman spectra and elemental distribution, the formation of the convex microstructures is investigated. Also, the effect of experimental parameters including laser power, scanning speed, etching duration and etching temperature on the microstructures' three-dimensional size is discussed in detail. In addition, the hydrophobic property of a surface with large-area convex grid-patterned microstructures was explored. [ABSTRACT FROM AUTHOR]