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Effect of Active Layer Scaling on the Performance of Ge1–xSnx Phototransistors.
- Source :
-
IEEE Transactions on Electron Devices . Sep2019, Vol. 66 Issue 9, p3867-3873. 7p. - Publication Year :
- 2019
-
Abstract
- The impact of scaling of the base layer on the noise performance, spectral responsivity, and frequency response of Ge/Ge1–xSnx/Ge p-n-p heterojunction phototransistor (HPT) is presented and evaluated by simulation. The proposed structure consists of Ge1–xSnx alloy in the base layer, allowing extension of the photodetection to the mid-infrared (MIR) region, enabling photodetection over a wide range. This paper also includes the effect of Sn concentration and base bias voltage on the frequency performance of the HPT. In addition, various noise components and signal-to-noise ratio (SNR) are estimated as a function of base layer thickness and base resistance. The simulated results show that cutoff frequency (${f}_{T}$) and maximum frequency (${f}_{\text {max}}$) are not only strongly dependent on the base layer thickness but also on the Sn composition in the base layer and applied base-bias voltage. The results show that the proposed HPT provides higher ${f}_{T} >45$ GHz and SNR of >70 dB for the base layer thickness of 50 nm (with Sn = 9%) can be achieved. Therefore, the GeSn p-n-p HPT is promising for future fiber-optic telecommunication and MIR applications. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 00189383
- Volume :
- 66
- Issue :
- 9
- Database :
- Academic Search Index
- Journal :
- IEEE Transactions on Electron Devices
- Publication Type :
- Academic Journal
- Accession number :
- 138938136
- Full Text :
- https://doi.org/10.1109/TED.2019.2925892