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CMP ROAD GETS ROUGH.

Authors :
McCoy, Michael
Source :
Chemical & Engineering News. 8/2/2004, Vol. 82 Issue 31, p20-23. 4p.
Publication Year :
2004

Abstract

Highlights the Semicon West Semiconductor equipment and materials trade show in San Francisco, California. Intention of the chemical makers to enter in the chemical mechanical planarization (CMP) slurries; Introduction of CMP tool by Applied Materials and Novellus; Financial performance of the chemical companies.

Details

Language :
English
ISSN :
00092347
Volume :
82
Issue :
31
Database :
Academic Search Index
Journal :
Chemical & Engineering News
Publication Type :
Periodical
Accession number :
14109868
Full Text :
https://doi.org/10.1021/cen-v082n031.p020