Energetics of reactions in a dielectric barrier discharge with argon carrier gas: VIII hydrofluoromethanes.

The method we have developed for understanding energetic exchanges between precursor molecules and argon (Ar) carrier gas in a dielectric barrier discharge (DBD) has much‐proven merit. The present article focuses on hydrofluoromethanes, CHxFy. The precursors (‰ concentrations) were mixed with Ar in a 20 kHz, 8 kV (peak‐to‐peak) DBD. For each compound, Em, the energy absorbed per molecule, was plotted as a function of precursor flow rate. Besides the determination of Em, we have used optical emission spectroscopy as a diagnostic of the plasma physicochemistry. The influence of chemical structure has been investigated by depositing thin plasma polymer coatings; we have measured their deposition rates and water contact angles, which have been correlated with Em values and X‐ray photoelectron spectroscopy measurements. [ABSTRACT FROM AUTHOR]