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Electron inducing soft errors in 28 nm system-on-Chip.
- Source :
-
Radiation Effects & Defects in Solids: Incorporating Plasma Techniques & Plasma Phenomena . Jul/Aug2020, Vol. 175 Issue 7/8, p745-754. 10p. - Publication Year :
- 2020
-
Abstract
- The 28 nm system-on-chip (SoC) was irradiated by 12 MeV electron at the China Institute of Atomic Energy (CIAE) for the first time. Soft errors in the on-chip memory (OCM), D-Cache, Register and BRAM blocks were investigated. The obtained device cross sections are almost in the range of 10−13 cm2 to 10−11 cm2 for the blocks. The results demonstrate that electron fluence per pulse and the corresponding prompt dose rates have no influence on the soft errors in 28 nm SoC. The discrepancy was analyzed between proton and electron inducing soft errors in D-Cache and BRAM blocks, too. The secondary electron is considered as the dominant reason for soft errors caused by 12 MeV electron in 28 nm SoC. [ABSTRACT FROM AUTHOR]
- Subjects :
- *NUCLEAR energy
*ELECTRONS
*SOFT errors
*SYSTEMS on a chip
Subjects
Details
- Language :
- English
- ISSN :
- 10420150
- Volume :
- 175
- Issue :
- 7/8
- Database :
- Academic Search Index
- Journal :
- Radiation Effects & Defects in Solids: Incorporating Plasma Techniques & Plasma Phenomena
- Publication Type :
- Academic Journal
- Accession number :
- 144636923
- Full Text :
- https://doi.org/10.1080/10420150.2020.1759067