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Electron inducing soft errors in 28 nm system-on-Chip.

Authors :
Yang, Weitao
Li, Yonghong
Zhang, Weidong
Guo, Yaxin
Zhao, Haoyu
Wei, Jianan
Li, Yang
He, Chaohui
Chen, Kesheng
Guo, Gang
Du, Boyang
Luca, Sterpone
Source :
Radiation Effects & Defects in Solids: Incorporating Plasma Techniques & Plasma Phenomena. Jul/Aug2020, Vol. 175 Issue 7/8, p745-754. 10p.
Publication Year :
2020

Abstract

The 28 nm system-on-chip (SoC) was irradiated by 12 MeV electron at the China Institute of Atomic Energy (CIAE) for the first time. Soft errors in the on-chip memory (OCM), D-Cache, Register and BRAM blocks were investigated. The obtained device cross sections are almost in the range of 10−13 cm2 to 10−11 cm2 for the blocks. The results demonstrate that electron fluence per pulse and the corresponding prompt dose rates have no influence on the soft errors in 28 nm SoC. The discrepancy was analyzed between proton and electron inducing soft errors in D-Cache and BRAM blocks, too. The secondary electron is considered as the dominant reason for soft errors caused by 12 MeV electron in 28 nm SoC. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
10420150
Volume :
175
Issue :
7/8
Database :
Academic Search Index
Journal :
Radiation Effects & Defects in Solids: Incorporating Plasma Techniques & Plasma Phenomena
Publication Type :
Academic Journal
Accession number :
144636923
Full Text :
https://doi.org/10.1080/10420150.2020.1759067