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Achieving Superior Electrocatalytic Performance by Surface Copper Vacancy Defects during Electrochemical Etching Process.

Authors :
Guo, Niankun
Xue, Hui
Bao, Amurisana
Wang, Zihong
Sun, Jing
Song, Tianshan
Ge, Xin
Zhang, Wei
Huang, Keke
He, Feng
Wang, Qin
Source :
Angewandte Chemie International Edition. 8/10/2020, Vol. 59 Issue 33, p13778-13784. 7p.
Publication Year :
2020

Abstract

Vacancy defects of catalysts have been extensively studied and proven to be beneficial to various electrocatalytic reactions. Herein, an ultra‐stable three‐dimensional PtCu nanowire network (NNW) with ultrafine size, self‐supporting rigid structure, and Cu vacancy defects has been developed. The vacancy defect‐rich PtCu NNW exhibits an outstanding performance for the oxygen reduction reaction (ORR), with a mass activity 14.1 times higher than for the commercial Pt/C catalyst (20 %.wt, JM), which is currently the best performance. The mass activity of the PtCu NNW for methanol oxidation reaction (MOR) is 17.8 times higher than for the commercial Pt/C catalyst. Density‐functional theory (DFT) calculations indicate that the introduction of Cu vacancies enhances the adsorption capacity of Pt atoms to the HO* intermediate and simultaneously weakens the adsorption for the O* intermediate. This work presents a facile strategy to assemble efficient electrocatalysts with abundant vacancy defects, at the same time, provides an insight into the ORR mechanism in acidic solution. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
14337851
Volume :
59
Issue :
33
Database :
Academic Search Index
Journal :
Angewandte Chemie International Edition
Publication Type :
Academic Journal
Accession number :
144931417
Full Text :
https://doi.org/10.1002/anie.202002394