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Effect of electrode surface micro-protrusions on the breakdown time delay and jitter for nanosecond pulsed gas discharge under hundreds of kV/cm in sulfur hexafluoride.

Authors :
Guo, Fan
Xie, Yanzhao
Jia, Wei
Xie, Linshen
Chen, Zhiqiang
Luo, Weixi
Wu, Wei
Source :
Physics of Plasmas. Aug2020, Vol. 27 Issue 8, p1-7. 7p.
Publication Year :
2020

Abstract

For nanosecond pulsed gas discharge under hundreds of kV/cm in sulfur hexafluoride (SF6), the electric field emission (EFE) effect may be the mechanism of the initial electrons. Electrode surface micro-protrusions (ESMPs) generated after discharging, would affect the discharge process under a high electric field. To investigate the effect of ESMPs on the breakdown time delay and jitter, the breakdown characteristics of different electrode materials and surface roughness are determined in this paper. Three types of electrode materials include stainless 304L, EDM-AF5 graphite, and CuW70 W-Cu alloy. The influences of stainless 304L electrodes with surface roughness coefficients of 1.6 and 0.8 on the breakdown delay and jitter are compared. After 700 discharge shots, the morphology characteristics and distributions of ESMPs are observed by a contourgraph. Based on the statistical results of ESMPs and EFE theory, the relationship between the electric field of EFE and ESMPs can be calculated. In addition, the effective electron rates of negative ion detachment (NID) are estimated. The experimental and calculation results indicate that the initial electrons are mainly produced by the EFE effect. When the pressure is below 0.5 MPa, the NID effect is limited and the breakdown time delay and jitter are dependent on the height to radius ratio and distributions of ESMPs. Once the pressure exceeds 0.5 MPa, the NID effect will be significant and the influence of ESMPs can be neglected. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
1070664X
Volume :
27
Issue :
8
Database :
Academic Search Index
Journal :
Physics of Plasmas
Publication Type :
Academic Journal
Accession number :
145434804
Full Text :
https://doi.org/10.1063/5.0005499