Cite
Novel Epitaxy for Nitride Semiconductors Using Plasma Technology.
MLA
Oda, Osamu, and Masaru Hori. “Novel Epitaxy for Nitride Semiconductors Using Plasma Technology.” Physica Status Solidi. A: Applications & Materials Science, vol. 218, no. 1, Jan. 2021, pp. 1–20. EBSCOhost, https://doi.org/10.1002/pssa.202000462.
APA
Oda, O., & Hori, M. (2021). Novel Epitaxy for Nitride Semiconductors Using Plasma Technology. Physica Status Solidi. A: Applications & Materials Science, 218(1), 1–20. https://doi.org/10.1002/pssa.202000462
Chicago
Oda, Osamu, and Masaru Hori. 2021. “Novel Epitaxy for Nitride Semiconductors Using Plasma Technology.” Physica Status Solidi. A: Applications & Materials Science 218 (1): 1–20. doi:10.1002/pssa.202000462.