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Growth kinetics of the ferroelectric Al-doped HfO2 thin films via synergistic effect of various essential factors.

Authors :
Mao, Yanhu
Zhang, Wanli
Cui, Lian
Tang, Minghua
Su, Pengyu
Long, Xiaojiang
Li, Gang
Xiao, Yongguang
Yan, Shaoan
Source :
Ceramics International. Feb2021, Vol. 47 Issue 4, p4674-4680. 7p.
Publication Year :
2021

Details

Language :
English
ISSN :
02728842
Volume :
47
Issue :
4
Database :
Academic Search Index
Journal :
Ceramics International
Publication Type :
Academic Journal
Accession number :
147995306
Full Text :
https://doi.org/10.1016/j.ceramint.2020.10.034