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Realization of red electroluminescence from Ga2O3:Eu/Si based light-emitting diodes.
- Source :
-
Superlattices & Microstructures . Feb2021, Vol. 150, pN.PAG-N.PAG. 1p. - Publication Year :
- 2021
-
Abstract
- Eu doped Ga 2 O 3 film has been grown on n -Si (111) substrate by pulsed laser deposition. Excellent structural and optical properties of the obtained Ga 2 O 3 :Eu film have been confirmed by X-ray diffraction, Raman and photoluminescence measurements. Subsequently, Ga 2 O 3 :Eu/ n -Si based light-emitting diode was successfully fabricated with a multilayer structure of ITO/Ga 2 O 3 :Eu/ n -Si/Au. Intense red electroluminescence peaking at 615 nm has been observed at room temperature by naked eyes from the fabricated device when a positive bias voltage is applied on the n -Si substrate. The current-voltage characteristics and electroluminescence spectra indicate that the Ga 2 O 3 :Eu/ n -Si based light-emitting diode has a rather low driven voltage of ~7.9 V. The origin of the Eu-related electroluminescence has been clarified to originate from the defect-assisted energy transfer from Ga 2 O 3 host to Eu3+ ions. We believe that this study will offer the possibility to develop the silicon-compatible full-color displays or lighting technology using Ga 2 O 3 as host material. • Eu doped β- Ga 2 O 3 film was deposited on n -Si substrate by pulsed laser deposition. • Red light-emitting diode was fabricated based on Ga 2 O 3 :Eu/ n -Si heterostructure. • Intense red electroluminescence at 615 nm was achieved from the diode with a low driven voltage of 7.9 V. • The electroluminescence mechanism of Ga 2 O 3 :Eu/ n -Si based diode was investigated. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 07496036
- Volume :
- 150
- Database :
- Academic Search Index
- Journal :
- Superlattices & Microstructures
- Publication Type :
- Academic Journal
- Accession number :
- 148434275
- Full Text :
- https://doi.org/10.1016/j.spmi.2021.106814