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Polymeric optical waveguides using direct ultraviolet photolithography process.

Authors :
Tung, K.K.
Wong, W.H.
Pun, E.Y.B.
Source :
Applied Physics A: Materials Science & Processing. 2005, Vol. 80 Issue 3, p621-626. 6p.
Publication Year :
2005

Abstract

Single-mode polymeric channel waveguides were fabricated using simple direct ultraviolet photolithography process. A cross-linkable negative tone epoxy NANOTM SU-8 2000 polymer was used. Once exposed to ultraviolet light through a photomask, the waveguide stripes were obtained upon development. The polymer has many desirable properties, such as high refractive index, good adhesion to substrate, optical transparency in the infrared wavelength region, and high glass transition and high thermal decomposition temperatures. Properties of the optical waveguides were characterized, and there is an excellent agreement between measured data and theory. The values of dn/dT and waveguide birefringence are -1.87×10-4 /°C and ~10-4, respectively, and are comparable to those of halogenated acrylate polymers. With an overcladding layer, the propagation losses measured are 0.25 and 0.28 dB/cm at 0.8 µm, 0.62 and 0.77 dB/cm at 1.31 µm, and 1.25 and 1.71 dB/cm at 1.55 µm for TE and TM polarizations, respectively. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
09478396
Volume :
80
Issue :
3
Database :
Academic Search Index
Journal :
Applied Physics A: Materials Science & Processing
Publication Type :
Academic Journal
Accession number :
15312587
Full Text :
https://doi.org/10.1007/s00339-003-2248-8