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Technological stress and the intention to stay in organizations: Do the quality of life and work-home conflict mediate this relationship?

Authors :
de Carvalho, Ozaias Wagner Ferreira
d'Angelo, Marcia Juliana
Source :
Contextus: Revista Contemporanea de Economia e Gestao. jan-dez2021, Vol. 19, p176-196. 21p.
Publication Year :
2021

Abstract

This quantitative descriptive study discusses the effects of technostress on work-home conflict, on quality of life and on intention to stay in organizations among the Information and Communication Technology (ICT) users' in their daily work. It is a descriptive and quantitative research with 473 respondents from both public and private companies. The results confirm the negative effects of technostress creators and the positive effects of technostress inhibitors in work-home conflict, quality of life, and the intention to stay in organizations. Finally, quality of life partially mediates the relationship between technostress and the intention to stay in the organizations. [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
16782089
Volume :
19
Database :
Academic Search Index
Journal :
Contextus: Revista Contemporanea de Economia e Gestao
Publication Type :
Academic Journal
Accession number :
156007263
Full Text :
https://doi.org/10.19094/contextus.2021.62600