Cite
In-situ Ar plasma treatment as a low thermal budget technique for high performance InGaSnO thin film transistors fabricated using magnetron sputtering.
MLA
Hu, Mengzhen, et al. “In-Situ Ar Plasma Treatment as a Low Thermal Budget Technique for High Performance InGaSnO Thin Film Transistors Fabricated Using Magnetron Sputtering.” Applied Surface Science, vol. 604, Dec. 2022, p. N.PAG. EBSCOhost, https://doi.org/10.1016/j.apsusc.2022.154621.
APA
Hu, M., Xu, L., Zhang, X., Song, Z., & Luo, S. (2022). In-situ Ar plasma treatment as a low thermal budget technique for high performance InGaSnO thin film transistors fabricated using magnetron sputtering. Applied Surface Science, 604, N.PAG. https://doi.org/10.1016/j.apsusc.2022.154621
Chicago
Hu, Mengzhen, Lei Xu, Xinnan Zhang, Zengcai Song, and Shijun Luo. 2022. “In-Situ Ar Plasma Treatment as a Low Thermal Budget Technique for High Performance InGaSnO Thin Film Transistors Fabricated Using Magnetron Sputtering.” Applied Surface Science 604 (December): N.PAG. doi:10.1016/j.apsusc.2022.154621.