PdPt y /V 2 O 5 -TiO 2 : Highly Active Catalysts with Good Moisture- and Sulfur Dioxide-Resistant Performance in Toluene Oxidation.

Catalytic performance and moisture and sulfur dioxide resistance are important for a catalyst used for the oxidation of volatile organic compounds (VOCs). Supported noble metals are active for VOC oxidation, but they are easily deactivated by water and sulfur dioxide. Hence, it is highly desired to develop a catalyst with high performance and good moisture and sulfur dioxide resistance in the oxidation of VOCs. In this work, we first adopted the hydrothermal method to synthesize a V2O5-TiO2 composite support, and then employed the polyvinyl alcohol (PVA)-protecting NaBH4 reduction strategy to fabricate xPdPty/V2O5-TiO2 catalysts (x and y are the PdPty loading (0.41, 0.46, and 0.49 wt%) and Pt/Pd molar ratio (2.10, 0.85, and 0.44), respectively; the corresponding catalysts are denoted as 0.46PdPt2.10/V2O5-TiO2, 0.41PdPt0.85/V2O5-TiO2, and 0.49PdPt0.44/V2O5-TiO2). Among all the samples, 0.46PdPt2.10/V2O5-TiO2 exhibited the best catalytic activity for toluene oxidation (T50% = 220 °C and T90% = 245 °C at a space velocity of 40,000 mL/(g h), apparent activation energy (Ea) = 45 kJ/mol), specific reaction rate at 230 °C = 98.6 μmol/(gPt s), and turnover frequency (TOFNoble metal) at 230 °C = 142.2 × 10−3 s−1. The good catalytic performance of 0.46PdPt2.10/V2O5-TiO2 was associated with its well-dispersed PdPt2.10 nanoparticles, high adsorbed oxygen species concentration, good redox ability, large toluene adsorption capacity, and strong interaction between PdPty and V2O5-TiO2. No significant changes in toluene conversion were detected when 5.0 vol% H2O or 50 ppm SO2 was introduced to the reaction system. According to the characterization results, we can realize that vanadium is the main site for SO2 adsorption while PdO is the secondary site for SO2 adsorption, which protects the active Pt site from being poisoned by SO2, thus making the 0.46PdPt2.10/V2O5TiO2 catalyst show good sulfur dioxide resistance. [ABSTRACT FROM AUTHOR]