Database Development of SiO 2 Etching with Fluorocarbon Plasmas Diluted with Various Noble Gases of Ar, Kr, and Xe.

MLA

Lee, Youngseok, et al. “Database Development of SiO 2 Etching with Fluorocarbon Plasmas Diluted with Various Noble Gases of Ar, Kr, and Xe.” Nanomaterials (2079-4991), vol. 12, no. 21, Nov. 2022, p. 3828. EBSCOhost, https://doi.org/10.3390/nano12213828.

APA

Lee, Y., Yeom, H., Choi, D., Kim, S., Lee, J., Kim, J., Lee, H., & You, S. (2022). Database Development of SiO 2 Etching with Fluorocarbon Plasmas Diluted with Various Noble Gases of Ar, Kr, and Xe. Nanomaterials (2079-4991), 12(21), 3828. https://doi.org/10.3390/nano12213828

Chicago

Lee, Youngseok, Heejung Yeom, Daehan Choi, Sijun Kim, Jangjae Lee, Junghyung Kim, Hyochang Lee, and ShinJae You. 2022. “Database Development of SiO 2 Etching with Fluorocarbon Plasmas Diluted with Various Noble Gases of Ar, Kr, and Xe.” Nanomaterials (2079-4991) 12 (21): 3828. doi:10.3390/nano12213828.