Organosilicon-Based Hybrid Materials Produced Using Low Temperature Plasma.

Published data on the effect of low-temperature plasma on polydimethylsiloxane have been analyzed. Changes in the contact properties, chemical structure, and morphology of the modified polymer surface have been revealed using modern research techniques (contact angle measurement, X-ray photoelectron spectroscopy, Fourier-transform IR spectroscopy, atomic force and scanning electron microscopy). It has been shown that modification by plasma results in the formation of a hybrid material that has the surface layer consisting mainly of silicon oxide. Plasma-enhanced chemical vapor deposition processes of hexamethyldisiloxane polymerization on various substrates are considered and the formation of similar hybrid materials containing a significant amount of silicon oxide is shown. Data on the use of such materials in biology, medicine, membranes, humidity sensors, and other fields of science and technology are presented. [ABSTRACT FROM AUTHOR]